Photomasks for various applications

3D Mask (Gray-tone Mask)
Toppan is providing high resolution, highly reliable photomasks not only for semiconductors, but also for different industrial areas / research purposes, utilizing its microfabrication technology.
Use of the Photomask
![[Mask for FC-BGA Substrate]](img/indx_pic_02.jpg)
[Mask for FC-BGA Substrate]
Toppan provides photomasks to various markets including industry, R&D, etc.
<Instances of Supply>
- Masks for MEMS
- Mask for IC bump packaging
- Masks for Semiconductor Packaging Substrates
- Masks for LED
- Masks for Thermal Head
- Mask for Device Accuracy control
- Test Chart
- Master masks for High-resolution Printing
- Masks for various R&D etc.
- Please make inquiries for more information.
Specification Outline
■Mask Size | 5inch x 5inch (127.0 mm x 127.0 mm) , 6inch x 6inch (152.4 mm x 152.4 mm)
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■Acceptable Data Format | GDS, GBR, or Design diagram |
■Substrate, etc. | Synthetic Quarts, Soda-lime Glass / Thickness: 0.09~0.25 inch (t) Pellicle mounting possible |
TOPPAN Test Chart
TOPPAN Test Chart is the photomask which formed the basic-shaped pattern with chromium on the high purity glass substrate.
We prepare for a positive type mask and a negative type mask.
It is available in the uses such as accuracy management of equipment, a resolution check, and a valuation basis at photoresist selection.

Standard Mask Pattern

In addition to the above standard products, we can also produce custom models.
3D Masks (Gray-tone Masks / Gray-scale Masks)
Gray-scale mask is a 3D photomask, applying the well-established photomask technology including high resolution. 3D structures including micro lens are formed by controlling transmission volume of the light.
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Microlens Structure (Prolith)
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Transferred Image of 3D mask
(AFM image of resist profile)
Examples of pattern type


