Photomasks for various applications
Toppan is providing high resolution, highly reliable photomasks not only for semiconductors, but also for different industrial areas / research purposes, utilizing its microfabrication technology.
Use of the Photomask
Toppan provides photomasks to various markets including industry, R&D, etc.
＜Instances of Supply＞
- Masks for MEMS
- Mask for IC bump packaging
- Masks for Semiconductor Packaging Substrates
- Masks for LED
- Masks for Thermal Head
- Mask for Device Accuracy control
- Test Chart
- Master masks for High-resolution Printing
- Masks for various R&D etc.
- Please make inquiries for more information.
|■Mask Size||5inch x 5inch (127.0 mm x 127.0 mm) , 6inch x 6inch (152.4 mm x 152.4 mm)
|■Acceptable Data Format||GDS, GBR, or Design diagram|
|■Substrate, etc.||Synthetic Quarts, Soda-lime Glass / Thickness: 0.09～0.25 inch (t)
Pellicle mounting possible
TOPPAN Test Chart
TOPPAN Test Chart is the photomask which formed the basic-shaped pattern with chromium on the high purity glass substrate.
We prepare for a positive type mask and a negative type mask.
It is available in the uses such as accuracy management of equipment, a resolution check, and a valuation basis at photoresist selection.
Standard Mask Pattern
In addition to the above standard products, we can also produce custom models.
3D Masks (Gray-tone Masks / Gray-scale Masks)
Gray-scale mask is a 3D photomask, applying the well-established photomask technology including high resolution. 3D structures including micro lens are formed by controlling transmission volume of the light.
Microlens Structure (Prolith)
Transferred Image of 3D mask
(AFM image of resist profile)