The photomask is an essential device to be used in the manufacturing process of integrated circuits such as LSI.
It is a transparent glass plate (composite quartz) on which extremely fine microcircuit patterns are etched on the light shielded film and plays a role as a master when circuits are printed on silicon wafers. The patterns on the photomask are reduced and optically transferred onto wafers to form fine patterns.
Mask patterns are formed on a blank substrate based on circuit pattern data using electron beam lithography technology. The photomask is fabricated through etching, resist strip, cleaning, measurement, and inspection processes.
Toppan has been vigorously supporting development of the semiconductor industry through its manufacture of photomasks since 1961. At the same time, in order to satisfy the demand for much finer patterns on evolving LSIs, we are continuously developing phase-shifting masks and more advanced photomask products using the next generation of exposure technology.
In the manufacturing process of semiconductors such as LSI, a pattern on the photomask is reduced and exposed on a silicon wafer a number of times while the stepper (i.e. reduced projection type exposure machine) shifts, transferring multiple element patterns on each wafer.
[Examples of application]
■Semiconductor ■Optical waveguide / Optical device ■MEMS ■LCD ■LED ■Microlens array ■Accuracy measurement ■Resolution Test Chart etc.
In order to provide the globalizing semiconductor market with prompt and meticulous services, Toppan has a manufacturing network of eight sites throughout the world.
It is the world's sole supplier to have manufacturing sites in all of North America, Europe, Asia and JAPAN.