Silicon stencil masks / Molds for nanoimprint

Stencil Masks

Stencil Masks

Silicon stencil mask is a photomask for Electron Beam Lithography, with nanometer size apertures to fabricate nanometer scale patterns.

EB Lithography has been extensively studied in the Semiconductor industry as a technology to manufacture an advanced photomask.

Toppan has been developing stencil masks as a core technology of microfabrication and establishing a supply system.

  • [EB writer and Stencil Masks]

  • Close-up

Molds for nanoimprint

Nanoimprint lithography (NIL)

Nanoimprint lithography is a microfabrication technology used to transfer patterns that measure a few dozen nanometers by placing resin between a mold and a substrate and hardening the resin. Its process is so simple that it is expected to enable inexpensive and highly repeatable mass volume manufacturing of microstructures.
Toppan develops and produces high-precision molds for nanoimprint lithography, applying lithography technologies that have been developed in the company’s semiconductor photomask business.

Methods of nanoimprint lithography

Nanoimprint lithography can be roughly classified into two types: “UV method” and “Thermal Method”

UV Nanoimprint Method

The UV nanoimprint method replicates patterns by pressing the pattern on the mold against UV-curable resin, which is the hardened by UV Irradiation.
Working at normal temperature is possible, giving this method the unique nature of allowing a high level of precision in the replication of patterns.

Thermal Nanoimprint Method

The thermal nanoimprint method replicates patterns by pressing the pattern on the mold strongly against thermoplastic resin, which is then cooled after being heated. Direct processing is possible for a variety of Products if they are made of materials that are softened by heating.

Mold material

Quartz molds

Quartz molds are mainly used in the UV nanoimprint method. quartz is used as the material for semiconductor photomasks. It is characterized by high rigidity and flatness. The manufacturing process, same as that of semiconductor photomask’s, allows to fabricate fine level patterns that measure a few dozen nanometers. Toppan also develops and manufactures multistage structure molds.

Substrate size : 6025(152×152×6.35mm(t))

  • High-definition pattern example
  • Multi-stage structure
    pattern example

Silicon molds

Silicon molds are mainly used in the thermal nanoimprint method. Patterns are drawn with an electron beam on a silicon substrate that has been coated with photosensitive resin. Dry etching is then used to make the patterns deeper.
The manufacturing process, same as that of Quartz mold’s, allows to form fine precision patterns. Silicon molds with high aspect ratio patterns are under development.

  • Wafer Molds
      • 10µm

      • 2µm

      • 5µm

      • 1µm

      Each of Dimensions: 3µm

  • High-aspect-ratio patterns

Pattern shape examples

We have already had extensive achievements as Toppan is offering various molds satisfying customers’ needs. We are also focusing on research and development, including the development of three-dimensional structure patterns.
Please feel free to consult us regarding your desired pattern shape, etc.

Standard Nanoimprint Lithography Silicon Molds for Evaluation

We can offer standard mold sample at relatively low price.
Please use it for evaluation.

Specifications Overview

    • Substrate (Si) thickness:725um
    • Pattern area      : □ 18mm
    • Chip size       : □ 1inch

Standard mold sample : Line-up (Silicon mold)

Pattern Line & Space Hole Pillar
Pattern pitch
200nm 400nm 1000nm 300nm 400nm 400nm
Pattern pitch 100nm 200nm 500nm 150nm 200nm 200nm
Top width 110nm 220nm 510nm 195nm 240nm 141nm
Bottom width 140nm 240nm 540nm 164nm 210nm 178nm
Pattern hight 250nm 270nm 270nm 260nm 220nm 230nm

Cross-section image of mold pattern