Silicon stencil masks / Molds for nanoimprint
Stencil Masks
Silicon stencil mask is a photomask for Electron Beam Lithography, with nanometer size apertures to fabricate nanometer scale patterns.
EB Lithography has been extensively studied in the Semiconductor industry as a technology to manufacture an advanced photomask.
Toppan has been developing stencil masks as a core technology of microfabrication and establishing a supply system.
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[EB writer and Stencil Masks]
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Close-up
Molds for nanoimprint
Nanoimprint lithography (NIL)
Nanoimprint lithography is a microfabrication technology used to transfer patterns that measure a few dozen nanometers by placing resin between a mold and a substrate and hardening the resin. Its process is so simple that it is expected to enable inexpensive and highly repeatable mass volume manufacturing of microstructures.
Toppan develops and produces high-precision molds for nanoimprint lithography, applying lithography technologies that have been developed in the company’s semiconductor photomask business.
Methods of nanoimprint lithography
Nanoimprint lithography can be roughly classified into two types: “UV method” and “Thermal Method”
UV Nanoimprint Method
The UV nanoimprint method replicates patterns by pressing the pattern on the mold against UV-curable resin, which is the hardened by UV Irradiation.
Working at normal temperature is possible, giving this method the unique nature of allowing a high level of precision in the replication of patterns.
Thermal Nanoimprint Method
The thermal nanoimprint method replicates patterns by pressing the pattern on the mold strongly against thermoplastic resin, which is then cooled after being heated. Direct processing is possible for a variety of Products if they are made of materials that are softened by heating.
Mold material
Quartz molds
Quartz molds are mainly used in the UV nanoimprint method. quartz is used as the material for semiconductor photomasks. It is characterized by high rigidity and flatness. The manufacturing process, same as that of semiconductor photomask’s, allows to fabricate fine level patterns that measure a few dozen nanometers. Toppan also develops and manufactures multistage structure molds.
Substrate size : 6025(152×152×6.35mm(t))
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High-definition pattern example
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Multi-stage structure
pattern example
Silicon molds
Silicon molds are mainly used in the thermal nanoimprint method. Patterns are drawn with an electron beam on a silicon substrate that has been coated with photosensitive resin. Dry etching is then used to make the patterns deeper.
The manufacturing process, same as that of Quartz mold’s, allows to form fine precision patterns. Silicon molds with high aspect ratio patterns are under development.
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Wafer Molds
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10µm
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2µm
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5µm
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1µm
Each of Dimensions: 3µm
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High-aspect-ratio patterns
Pattern shape examples
We have already had extensive achievements as Toppan is offering various molds satisfying customers’ needs. We are also focusing on research and development, including the development of three-dimensional structure patterns.
Please feel free to consult us regarding your desired pattern shape, etc.
Standard Nanoimprint Lithography Silicon Molds for Evaluation
We can offer standard mold sample at relatively low price.
Please use it for evaluation.
Specifications Overview
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- Substrate (Si) thickness：725um
- Pattern area ： □ 18mm
- Chip size ： □ 1inch
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Standard mold sample : Line-up (Silicon mold)
| Pattern | Line & Space | Hole | Pillar | ||||
|---|---|---|---|---|---|---|---|
| Design value |
Pattern pitch width |
200nm | 400nm | 1000nm | 300nm | 400nm | 400nm |
| Pattern pitch | 100nm | 200nm | 500nm | 150nm | 200nm | 200nm | |
| measured value |
Top width | 110nm | 220nm | 510nm | 195nm | 240nm | 141nm |
| Bottom width | 140nm | 240nm | 540nm | 164nm | 210nm | 178nm | |
| Pattern hight | 250nm | 270nm | 270nm | 260nm | 220nm | 230nm | |
Cross-section image of mold pattern
